PROJECTS OF CALL 6 (2013)
CT218 - E450LMDAP
The overall goal of the E450LMDAP project is to develop 450 mm lithography and metrology modules and tools and to initiate distributed pilot line activities over the 450 mm lithography and metrology tool platform eco system. These pilot line activities will complement the activities from the already initiated ENIAC JU E450EDL project. In addition, also early 450 mm wafer 1x node advanced patter...